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Off-Axis Sputtering Deposition System for Growth of Single Crystalline Films
TS-015210 — This innovative deposition system is able to grow single crystalline films of a broad range of complex materials with unprecedented crystalline quality of binary, ternary and quaternary oxides and intermetallics with simple or complex crystal structures.
Sputter deposition is one of the dominant techniques used in manufacturing films and coatings in many industries. Conventional sputtering uses an “on-axis” geometry, i.e., the substrate directly faces the sputter target. Due to the energetic bombardment of sputtered atoms, sputtering i…
  • College: College of Arts & Sciences
  • Inventors: Yang, Fengyuan
  • Licensing Officer: Hong, Dongsung

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