TS-074525 — Many advanced electronic, sensing, and optical devices rely on high‑quality thin films, yet manufacturing uniform, defect‑free films over large areas remains challenging. Conventional solution‑based approaches often result in rough, cracked, or non‑uniform coatings, while vacuum‑based de…

TS-073910 — Ferroelectric Hf₀.₅Zr₀.₅O₂ is a strategically important material for electronics, photonics, and energy applications, but its ferroelectric phase has historically been accessible only in ultrathin films or expensive single crystals. These approaches rely on high temperatures, complex dep…