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High-Quality Thick β-Ga₂O₃ Epitaxy for Ultra-High-Voltage Power Devices
TS-073810 — Next-generation power electronics demand materials that can support ultra-high breakdown voltages, low leakage currents, and scalable manufacturing. While β-Ga₂O₃ is highly attractive for these applications, device performance has been limited by the lack of high-quality, thick drift layers w…
  • College: College of Engineering (COE)
  • Inventors: Zhao, Hongping; Sarkar, Md Mosarof Hossain; Yu, Dong su
  • Licensing Officer: Randhawa, Davinder

Method for developing thick β-Ga2O3 films on (001) Ga2O3 substrates using (AlxGa1-x)2O3 buffer layer
TS-068473 — The Need β-Ga2O3 has spurred substantial interest in semiconductors and transistors in high-power/high-frequency electronics and ultraviolet optoelectronics. However, there exists a critical challenge of growing high-quality, thick layers of gallium oxide (Ga2O3) on Ga2O3 substrates. Existing …
  • College: College of Engineering (COE)
  • Inventors: Zhao, Hongping; Meng, Lingyu; Yu, Dong su
  • Licensing Officer: Randhawa, Davinder

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